Filtros : "Penacchio, Rafaela" Limpar

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  • Source: Applied Physics A: Materials Science and Processing (Applied Physics A). Unidade: IF

    Subjects: FILMES FINOS, TUNGSTÊNIO, DIFRAÇÃO POR RAIOS X

    Versão PublicadaAcesso à fonteDOIHow to cite
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    • ABNT

      SINGH, Hardepinder et al. Role of nitrogen partial pressure, deposition rate and annealing on stability of beta-W phase. Applied Physics A: Materials Science and Processing (Applied Physics A), v. 129, n. 5, 2023Tradução . . Disponível em: https://doi.org/10.1007/s00339-023-06552-x. Acesso em: 15 maio 2024.
    • APA

      Singh, H., Gupta, M., Gupta, P., Penacchio, R., Morelhao, S. L., & Kumar, H. (2023). Role of nitrogen partial pressure, deposition rate and annealing on stability of beta-W phase. Applied Physics A: Materials Science and Processing (Applied Physics A), 129( 5). doi:10.1007/s00339-023-06552-x
    • NLM

      Singh H, Gupta M, Gupta P, Penacchio R, Morelhao SL, Kumar H. Role of nitrogen partial pressure, deposition rate and annealing on stability of beta-W phase [Internet]. Applied Physics A: Materials Science and Processing (Applied Physics A). 2023 ; 129( 5):[citado 2024 maio 15 ] Available from: https://doi.org/10.1007/s00339-023-06552-x
    • Vancouver

      Singh H, Gupta M, Gupta P, Penacchio R, Morelhao SL, Kumar H. Role of nitrogen partial pressure, deposition rate and annealing on stability of beta-W phase [Internet]. Applied Physics A: Materials Science and Processing (Applied Physics A). 2023 ; 129( 5):[citado 2024 maio 15 ] Available from: https://doi.org/10.1007/s00339-023-06552-x

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